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Ground Quartz Cover Ring 12 Inch CCP Plasma Etching Quartz Ring for Dry Etch
| MOQ: | 30 euro of bespreekbaar |
| Prijs: | FOB Shanghai |
| Standard Packaging: | Schone plastic sluitzak + blauwe golfkartonnen doos + omdoos |
| Delivery Period: | 30-45 dagen |
| Betalingswijze: | T/T,L/C,D/A,D/P |
| Supply Capacity: | 1000e per maand |
Detailinformatie
Plaats van herkomst
nantong, jiangsu, China
Merknaam
JC
Certificering
MSDS, Rohs, REACH, ISO, GS, BV, Intertek
Modelnummer
ETCH-047
Specificatie:
Φ420 × Φ380 × 8,0 mm
Materiaal:
Hoogzuiver synthetisch gesmolten kwarts
Tolerantie:
±0,01 mm
Oppervlaktebehandeling:
Geslepen en vuurgepolijst
Schoonmaak:
Klasse 100 chemische reiniging
Sollicitatie:
12 inch CCP droge plasma-etskamer
Markeren:
Synthetic Fused Quartz Ring
,12 Inch CCP Cover Ring
,Plasma Etching Quartz Ring
Productomschrijving
This Ground Quartz Cover Ring is a high purity synthetic quartz plasma etching quartz ring built for 12 inch CCP dry plasma etching equipment. Positioned at the wafer perimeter, the ring confines the plasma sheath, shields the chamber edge and protects the wafer from edge erosion during long, high power etch steps. Because it is machined from synthetic fused quartz rather than natural quartz, the ring offers an exceptionally low level of metallic and hydroxyl contamination,
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