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Ground Quartz Cover Ring 12 Inch CCP Plasma Etching Quartz Ring for Dry Etch
| MOQ: | 30 ea atau bisa dinegosiasikan |
| Harga: | FOB Shanghai |
| standard packaging: | Kantong penyegel plastik bersih + kotak bergelombang biru + karton induk |
| Delivery period: | 30-45 hari |
| metode pembayaran: | T/T,L/C,D/A,D/P |
| Supply Capacity: | 1000ea per bulan |
Informasi Rinci
Tempat asal
Nantong, Jiangsu, Tiongkok
Nama merek
JC
Sertifikasi
MSDS, Rohs, REACH, ISO, GS, BV, Intertek
Nomor model
DLL-047
Spesifikasi:
Φ420 × Φ380 × 8,0 mm
Bahan:
Kuarsa leburan sintetis dengan kemurnian tinggi
Toleransi:
±0,01mm
Perawatan permukaan:
Tanah dan api dipoles
Pembersihan:
Pembersihan kimia kelas 100
Aplikasi:
Ruang etsa plasma kering CCP 12 inci
Menyoroti:
Synthetic Fused Quartz Ring
,12 Inch CCP Cover Ring
,Plasma Etching Quartz Ring
Deskripsi Produk
This Ground Quartz Cover Ring is a high purity synthetic quartz plasma etching quartz ring built for 12 inch CCP dry plasma etching equipment. Positioned at the wafer perimeter, the ring confines the plasma sheath, shields the chamber edge and protects the wafer from edge erosion during long, high power etch steps. Because it is machined from synthetic fused quartz rather than natural quartz, the ring offers an exceptionally low level of metallic and hydroxyl contamination,
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